The Cornell NanoScale Science and Technology Facility enables rapid advancements in science, engineering and technology at the nanoscale by providing efficient access to nanotechnology infrastructure and expertise. CNF operates as a flexible open user facility and is proud to be a member of the National Nanotechnology Coordinated Infrastructure (NNCI). The Cornell Nanoscale Science and Technology Facility (CNF) is a leading university nanotechnology facility and has supported a broad base of users from Cornell, other universities, and companies across the United States for 45 years, CNF features the most advanced lithography capabilities of any university laboratory, with two JEOL ebeam lithography systems, three steppers (DUV, i-line, g-line), contact lithography, mask making, 2 photon lithography, and all associated support equipment. Key to our continued success are our 22 expert technical support staff who maintain the technology resource, train 100s of new users per year, and provide scientific support to our over 500 users per year.

The Advanced Lithography Research Associate will be a member of the technical staff at CNF, responsible for both user support and for leadership in advanced lithography and associated process integration, with emphasis on electron beam lithography. As part of their duties, the research associate will support advanced instrumentation including electron beam lithography systems, resist processing, advanced data preparation, computational methods, and process flow development. The incumbent will be part of a team consisting of CNF users and CNF tool & user support staff. The Research Associate will be responsible for both instruction and user process support in applications of advanced lithography. The incumbent must be able to interact effectively with a broad group of constituents, exercise a customer service demeanor, and exhibit excellent personal communication skills.

Responsibilities of this position include:

·         Maintain and/or direct external maintenance of advanced lithography instrumentation (most under service contract) as well as SEMs and AFMs and other characterization instruments as assigned. Specifically, ebeam lithography resources include both a JEOL JBX6300 and a JEOL JBX9500. Maintain excellent relations with vendor service engineers and vendor management; Keep detailed maintenance and performance logs. Maintain high availability and capability of the instruments.

• Develop, characterize, troubleshoot, and maintain electron beam lithography (and other advanced lithography) processes. Document and/or publish results as appropriate.
• Prepare training materials for correct operation of these advanced tools; Train users at all experience levels in the operation of the e-beam systems including SEMs and EBLs, and other metrology instruments.
• Training researchers on CAD and data preparation software.
• Support users in selection of appropriate lithography processes as well as process integration with other thin film techniques to achieve the user’s desired project goals. In some cases, this support may rise to the level of collaboration.
• Work with specific CNF users to design and implement appropriate process flows to meet the user’s needs.
• Advance the CNF's lithography capabilities. Plan, supervise, design and conduct necessary experiments to develop and characterize unit new processes and procedures involving advanced lithography and integration with thin film deposition and etching processes in order to provide an effective state-of-the-art facility for user research. Recommend equipment improvements and acquisitions as necessary
• Coordinate user/equipment support activities with other lithography and thin films staff

This is a hands-on process, equipment, and user support position. At least 20 hours per week will be spent in the cleanroom, with regular handling of hazardous chemicals. The successful candidate will have experience working in a multi-user fabrication facility with experience interacting with users and trainees at a broad range of levels. The successful candidate will have extensive experience not only with photo/ebeam lithography, but with associated process integration with other thin film technologies available in the facility.

This is a non-tenure track academic research support position that would be renewed indefinitely based on successful performance and continued funding.

Qualifications and Education Requirements

Ph.D. in Applied Physics, Electrical Engineering, Materials Science, Chemistry, or related field with a minimum of two years of experience in operation of electron beam lithography is required (see note below). Motivated to spend most of the workday in the cleanroom. Knowledge of all aspects of microfabrication technology including thin film production, etching, lithography, and analysis is required.

Must have demonstrated ability to apply novel imaginative and innovative solutions to design, engineer, modify, and repair equipment.

Must have demonstrated ability to work safely with hazardous chemicals, ability to work calmly in a stressful environment, and ability to interact effectively as part of a team with users at all levels of processing competence. Must assist in policy-setting and decision making for Fab protocols and procedures.

The listed Research Associate position is for an advanced lithography engineer at the Ph.D. level with a high level of experience and broad technology expertise in nanotechnology support. We encourage applications, however, from candidates at all levels with interest/experience in photolithography, electron beam lithography, electron microscopy, and thin film processing. Candidates with more limited experience or narrower expertise will be considered for appointment at other levels for related positions. Applicants without a Ph.D. should consider applying to a related posting at Cornell for Lithography Engineer at the Research Support Specialist level. Applicants should detail their specific relevant experience and interests in a cover letter and resume attached to the application. All applicants will be considered for all available positions.

Applications will be reviewed as they are received.

Preferred Skills

Experience with advanced stepper-based photolithography, electron beam lithography, or advanced electron microscopy. Process control, experimental design, and process/equipment troubleshooting experience desirable. Advanced technical computer skills including Computer Aided Design, pattern generation/conversion, LINUX, scripting, etc. recommended.

Electronic and mechanical system troubleshooting, design or repair experience desirable.

Experience supporting users in a multi-user facility desirable.